Direct Oxidative Nitrogen Fixation from Air and H 2 O by a Water Falling Film Dielectric Barrier Discharge Reactor at Ambient Pressure and Temperature-Reference-Cited by-同舟云学术

Direct Oxidative Nitrogen Fixation from Air and H 2 O by a Water Falling Film Dielectric Barrier Discharge Reactor at Ambient Pressure and Temperature

Published:2021-01-28 Issue:6 Volume:14 Page:1507-1511
ISSN:1864-5631
Container-title:ChemSusChem
language:en
Short-container-title:ChemSusChem

Author:

Liu Zhuo¹,Tian Yonghui²,Niu Guanghui³,Wang Xu⁴,Duan Yixiang⁴^ORCID

Affiliation:

1. School of Aeronautics and Astronautics Sichuan University Chengdu Sichuan 61005 P.R. China

2. College of Chemistry and Materials Science Northwest University Xi'an Shanxi 710069 P.R. China

3. Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Dortmund 44139 Germany

4. School of Mechanical Engineering Sichuan University Chengdu Sichuan 61005 P.R. China

Funder

Fundamental Research Funds for the Central Universities

Natural Science Foundation of Shaanxi Province

Publisher

Wiley

Subject

General Energy,General Materials Science,General Chemical Engineering,Environmental Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/cssc.202002794

Reference24 articles.

1. Beyond fossil fuel–driven nitrogen transformations

2. Contribution of Discharge Excited Atomic N, N 2 *, and N 2 + to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

3. A Plasma-Water Droplet Reactor for Process-Intensified, Continuous Nitrogen Fixation at Atmospheric Pressure

4. Prospects and Challenges for Solar Fertilizers

5. A review of the existing and alternative methods for greener nitrogen fixation

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