Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments-Reference-Cited by-同舟云学术

Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments

Author:

Meddeb H.¹²³⁴,Bearda Twan²,Dimassi Wissem³,Abdulraheem Yaser⁵,Ezzaouia Hatem³,Gordon Ivan²,Szlufcik Jozef²,Poortmans Jef²⁶

Affiliation:

1. KACST-Intel Consortium Center of Excellence in Nano-manufacturing Applications (CENA); Riyadh KSA

2. IMEC; Kapeldreef 75 3001 Leuven Belgium

3. Research and Technology Center of Energy; Photovoltaic Department; BP 95 Hammam-Lif 2050 Tunisia

4. University of Carthage Faculty of Sciences of Bizerta; Tunisia

5. Electrical Engineering Department, College of Engineering and Petroleum, Kuwait University; P.O. Box 5969 13060 Safat Kuwait

6. Faculty of Sciences; University of Hasselt; Martelarenlaan 42 3500 Hasselt Belgium

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Reference27 articles.

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