Excellent passivation of thin silicon wafers by HF-free hydrogen plasma etching using an industrial ICPECVD tool-Reference-Cited by-同舟云学术

Excellent passivation of thin silicon wafers by HF-free hydrogen plasma etching using an industrial ICPECVD tool

Published:2014-11-17 Issue:1 Volume:9 Page:47-52
ISSN:1862-6254
Container-title:physica status solidi (RRL) - Rapid Research Letters
language:en
Short-container-title:Phys. Status Solidi RRL

Author:

Tang Muzhi¹²,Ge Jia¹,Wong Johnson¹,Ling Zhi Peng¹²,Dippell Torsten³,Zhang Zhenhao³,Huber Marco³,Doerr Manfred³,Hohn Oliver³,Wohlfart Peter³,Aberle Armin Gerhard¹²,Mueller Thomas¹

Affiliation:

1. Solar Energy Research Institute of Singapore; National University of Singapore; 7 Engineering Drive 1 117574 Singapore Singapore

2. Department of Electrical and Computer Engineering; National University of Singapore; 117576 Singapore Singapore

3. Singulus Technologies AG; Hanauer Landstraße 103 63796 Kahl Germany

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssr.201409333/fullpdf

Reference34 articles.

1. Panasonic press release ® http://panasonic.co.jp/corp/news/official.data/data.dir/2014/04/en1404104/en140410-4.html

2. Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)

3. Analysis of intrinsic hydrogenated amorphous silicon passivation layer growth for use in heterojunction silicon wafer solar cells by optical emission spectroscopy

4. Passivation of textured substrates for a-Si:H/c-Si hetero-junction solar cells: Effect of wet-chemical smoothing and intrinsic a-Si:H interlayer

5. Low‐temperature surface cleaning method using low‐energy reactive ionized species

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5. Investigation of Low-Temperature Hydrogen Plasma-Etching Processes for Silicon Wafer Solar Cell Surface Passivation in an Industrial Inductively Coupled Plasma Deposition Tool;IEEE Journal of Photovoltaics;2016-01