Electroless Deposited Nickel Thin Films Alloyed with Thorium-Reference-Cited by-同舟云学术

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Electroless Deposited Nickel Thin Films Alloyed with Thorium

Published:2022-04-21 Issue:8 Volume:57 Page:2100194
ISSN:0232-1300
Container-title:Crystal Research and Technology
language:en
Short-container-title:Crystal Research and Technology

Author:

Schapiro Ilan¹²,Shandalov Michael³,Maman Nitzan²,Ezersky Vladimir²,Golan Yuval¹²^ORCID,Yahel Eyal³

Affiliation:

1. Department of Materials Engineering Ben‐Gurion University of the Negev Beer‐Sheva 8410501 Israel

2. Ilse Katz Institute for Nanoscale Science and Technology Ben‐Gurion University of the Negev Beer‐Sheva 8410501 Israel

3. Department of Physics Nuclear Research Center Negev P. O. Box 9001 Beer Sheva 84190 Israel

Funder

PAZY Foundation

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/crat.202100194

Reference58 articles.

1. Modern Electroplating

2. Effects of complexing agents on acidic electroless nickel deposition

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electroless Metallization of the Elements: Survey and Progress;ACS Applied Electronic Materials;2022-12-07

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