Rare-Earth Plasma Beyond Extreme Ultraviolet (BEUV) Sources at 6.xnm

Author:

OTSUKA TAKAMITSU1,HIGASHIGUCHI TAKESHI2,YUGAMI NOBORU2

Affiliation:

1. Faculty of Engineering; Utsunomiya University/School of Physics, University College Dublin; Japan

2. Faculty of Engineering; Utsunomiya University; Japan

Publisher

Wiley

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing

Reference30 articles.

1. Bakshi V EUV Sources for lithography SPIE Washington 2006

2. Attwood DT Soft X-rays and extreme ultraviolet radiation Cambridge University Press Cambridge 2000

3. Progress in semiconductor lithology techniques and the current status of EUV lithography;Okazaki;Reza Gakushi,2010

4. Banine V EUV lithography and EUVL sources: From the beginning to NEX and beyond Proceedings of the 2011 International Workshop on EUVL, EUV Litho Inc., Maui, Hawaii 2011

5. Unresolved transition arrays;Bauch;Physica Scripta,1988

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