Nanoscale Line Segment Fabrication Using Super-Resolution Near-Field Photolithography-Reference-Cited by-同舟云学术

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Nanoscale Line Segment Fabrication Using Super-Resolution Near-Field Photolithography

Published:2012-06-29 Issue:5 Volume:34 Page:284-294
ISSN:0161-0457
Container-title:Scanning
language:en
Short-container-title:Scanning

Author:

Yang Ching-Been¹

Affiliation:

1. Department of Mechanical Engineering; Taoyuan Innovation Institute of Technology; Chung Li City Taiwan R.O. C.

Funder

National Science Council, Taiwan, R.O.C.

Publisher

Wiley

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sca.21015/fullpdf

Reference25 articles.

1. Exact solution of Dill's model equation for positive photoresist kinetics;Babu;IEEE Electr Dev Lett,1986

2. Fiber laser probe for near field scanning optical microscopy;Betzig;Appl Phys Lett,1993

3. Near field diffraction by a slit: implication for superresolution microscopy;Betzig;Appl Optics,1986

4. Collection mode near field scanning optical microscopy;Betzig;Appl Phys Lett,1987

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanostructured biocomposites for tissue engineering scaffolds;Biomedical Composites;2017

2. Construction of a Line Segment Fabrication Model of Super-Resolution Near Field Photolithography and Parameters Analysis;Journal of Computational and Theoretical Nanoscience;2013-03-01

3. Using Gray-Based Taguchi Method to Construct Multi-Objective Optimal Model in Super-Resolution Near-Field Photolithography;Scanning;2012-07-05

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