MRCI investigations on dissociation energy and molecular constants of BCl(X1 Σ+ ) radical-Reference-Cited by-同舟云学术

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MRCI investigations on dissociation energy and molecular constants of BCl(X1 Σ+ ) radical

Published:2010-10-06 Issue:12 Volume:111 Page:2825-2834
ISSN:0020-7608
Container-title:International Journal of Quantum Chemistry
language:en
Short-container-title:Int. J. Quantum Chem.

Author:

Shi De-Heng,Liu Hui,Zhang Xiao-Niu,Sun Jin-Feng,Liu Yu-Fang,Zhu Zun-Lue

Funder

Program for Science and Technology Innovation Talents

National Natural Science Foundation of China

Innovation Scientists and Technicians Troop Construction Projects of Henan Province

Henan Innovation for University Prominent Research Talents

Publisher

Wiley

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,Atomic and Molecular Physics, and Optics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/qua.22699/fullpdf

Reference43 articles.

1. Dry etching characteristics of III?V semiconductors in microwave BCl3 discharges

2. Absorption spectroscopy in BCl3inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule

3. Burton , R. H. Gottscho , R. A. Smolinsky , G. Dry Etching for Micro Electronics Powell , R. A. Elsevier New York 1984

4. Plasma modelling for surface processing

5. Basic chemistry and mechanisms of plasma etching

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