Surface characterization of NiO thin films deposited by RF ‐magnetron sputtering at different thickness: Statistical and multifractal approach
Author:
Affiliation:
1. Faculty of Science, Department of Physics University of Kurdistan Sanandaj Kurdistan Iran
2. Research Center for Nanotechnology University of Kurdistan Sanandaj Kurdistan Iran
Publisher
Wiley
Subject
Medical Laboratory Technology,Instrumentation,Histology,Anatomy
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/jemt.24165
Reference35 articles.
1. Electrical percolation threshold in Ag–DLC nanocomposite films prepared by RF-sputtering and RF-PECVD in acetylene plasma
2. Investigation of Strain Effects on Photoelectrochemical Performance of Flexible ZnO Electrodes
3. Structural, optical and electrical characteristics of nickel oxide thin films synthesised through chemical processing method
4. Effect of sputtering power on optical properties of prepared TiO 2 thin films by thermal oxidation of sputtered Ti layers
5. Prepared σ-MnO2 thin films by chemical bath deposition methods and study of its optical and microstructure properties
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1. The correlation between surface scaling behavior and optical properties of NiO thin films nanostructures: An investigation based on fractal concepts;Ceramics International;2024-08
2. Growth Processing and Strategies: A Way to Improve the Gas Sensing Performance of Nickel Oxide-Based Devices;Chemosensors;2024-03-08
3. Influence of film thickness on structural, optical, and electrical properties of sputtered nickel oxide thin films;Microscopy Research and Technique;2024-02-21
4. Fractal and multifractal morphology of diamond-like carbon films with Ag:N doping;Afghanistan Research Journal - Natural Science;2023-05-01
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