Tungsten Diselenide Patterning and Nanoribbon Formation by Gas‐Assisted Focused‐Helium‐Ion‐Beam‐Induced Etching-Reference-Cited by-同舟云学术

Tungsten Diselenide Patterning and Nanoribbon Formation by Gas‐Assisted Focused‐Helium‐Ion‐Beam‐Induced Etching

Published:2017-02-24 Issue:4 Volume:1 Page:1600060
ISSN:2366-9608
Container-title:Small Methods
language:en
Short-container-title:Small Methods

Author:

Stanford Michael G.¹,Pudasaini Pushpa R.¹,Cross Nicholas¹,Mahady Kyle¹,Hoffman Anna N.¹,Mandrus David G.¹²,Duscher Gerd¹²,Chisholm Matthew F.²,Rack Philip D.¹³

Affiliation:

1. Department of Materials Science and Engineering University of Tennessee Knoxville TN 37996 USA

2. Materials Science and Technology Division Oak Ridge National Laboratory Oak Ridge TN 37831 USA

3. Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge TN 37831 USA

Funder

U.S. Department of Energy

Gordon and Betty Moore Foundation

National Science Foundation

Publisher

Wiley

Subject

General Materials Science,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/smtd.201600060

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5. Sub-10nm patterning by focused He-ion beam milling for fabrication of downscaled graphene nano devices

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