Novel polymeric platform produced by photodegradation‐induced rearrangement for a multifunctional negative photoresist-Reference-Cited by-同舟云学术

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Novel polymeric platform produced by photodegradation‐induced rearrangement for a multifunctional negative photoresist

Published:2022-11 Issue:2 Volume:34 Page:597-604
ISSN:1042-7147
Container-title:Polymers for Advanced Technologies
language:en
Short-container-title:Polymers for Advanced Techs

Author:

Yu Gang¹,Xu Qian¹²^ORCID,Lei Zhiyou¹,Lu Yanbing¹^ORCID,Xu Weijian¹,Wu Ruoxi³

Affiliation:

1. College of Chemistry and Chemical Engineering Hunan University Changsha People's Republic of China

2. Academician Workstation Changsha Medical University Changsha People's Republic of China

3. Department of Water Science and Engineering, College of Civil Engineering Hunan University Changsha People's Republic of China

Funder

National Key Research and Development Program of China

Publisher

Wiley

Subject

Polymers and Plastics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pat.5911

Reference24 articles.

1. Transfer Printing Techniques for Materials Assembly and Micro/Nanodevice Fabrication

2. Plasmonic nanostructures through DNA-assisted lithography

3. Photolithographic Patterning of Perovskite Thin Films for Multicolor Display Applications

4. High-Performance Air-Stable n-Type Transistors with an Asymmetrical Device Configuration Based on Organic Single-Crystalline Submicrometer/Nanometer Ribbons

5. Immobilization Strategies for Organic Semiconducting Conjugated Polymers

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography;Nanotechnology;2024-04-30

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