Properties of Inductivety-Coupled RF Plasmas Sustained with Internal Antenna for Deposition of Carbon-Related Films
Author:
Publisher
John Wiley & Sons, Inc.
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781118144145.ch63/fullpdf
Reference12 articles.
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3. Ion Bombardment Energy Distributions in a Radio Frequency Induction Plasma;Hopwood;Appl. Phys. Lett.,1993
4. Studies of The Low-Pressure Inductively-Coupled Plasma Etching for a Larger Area Wafer Using Plasma Modeling and Langmuir Probe;Collison;J. Vac. Sci. & Technol.,1998
5. Antenna Configuration for Uniform Large-Area Inductively Coupled Plasma Production;Kim;Appl. Phys. Lett.,2000
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