Influence of grain boundaries intentionally induced between seed plates on the defect generation in quasi-mono-crystalline silicon ingots

Author:

Trempa Matthias1,Reimann Christian1,Friedrich Jochen12,Müller Georg1,Krause Andreas3,Sylla Lamine3,Richter Thomas3

Affiliation:

1. Fraunhofer IISB; Schottkystr. 10 91058 Erlangen Germany

2. FraunhoferTHM; Am St.-Niclas-Schacht 13 09599 Freiberg Germany

3. SolarWorld Innovations GmbH; Berthelsdorfer Str. 111A 09599 Freiberg Germany

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference16 articles.

1. D. Hu T. Zhang L. He H. Chen D. Zhong S. Cao J. Gao Y. Wan Proceedings 38th IEEE Photovoltaics Specialist Conference Austin, USA 2012 2735 2738

2. Mono-Like Silicon Growth Using Functional Grain Boundaries to Limit Area of Multicrystalline Grains

3. The structure of high-angle grain boundaries

4. A New Preferential Etch for Defects in Silicon Crystals

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