Low‐Temperature Atomic Layer Deposition of MoS 2 Films-Reference-Cited by-同舟云学术

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Low‐Temperature Atomic Layer Deposition of MoS 2 Films

Published:2017-04-07 Issue:18 Volume:129 Page:5073-5077
ISSN:0044-8249
Container-title:Angewandte Chemie
language:en
Short-container-title:Angew. Chem.

Author:

Jurca Titel¹,Moody Michael J.²,Henning Alex²,Emery Jonathan D.²,Wang Binghao¹,Tan Jeffrey M.¹,Lohr Tracy L.¹,Lauhon Lincoln J.²,Marks Tobin J.¹^ORCID

Affiliation:

1. Department of Chemistry and the Materials Research Center Northwestern University 2145 Sheridan Road Evanston IL 60208 USA

2. Department of Materials Science and Engineering, and the Materials Research Center Northwestern University 2220 Campus Dr. Evanston IL 60208 USA

Funder

National Science Foundation

Publisher

Wiley

Subject

General Medicine

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ange.201611838

Reference103 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2.

3. Graphene Analogues of Inorganic Layered Materials

4. Graphen-analoge anorganische Schichtmaterialien

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