1. Positive shift in threshold voltage for reactive-ion-sputtered Al2O3/AlInN/GaN MIS-HEMT;Dutta;IEEE Electron Device Lett,2014
2. Polynomial noise modelling of silicon-based GaN HEMTs;Colangeli;Int. J. Numer. Model. Electron. Netw Devices Fields,2013
3. Rajabi S Orouji AA Moghadam AH Mahabadi Jamali SE Proceedings of the IEEE International Conference on Signal Processing, Communication, Computing and Networking Technologies (ICSCCN) 2011 269 271
4. Rajabi S Orouji AA Moghadam AH Mahabadi Jamali SE Proceedings of 2011 International Conference on Signal Processing, Communication, Computing and Networking Technologies (ICSCCN) 2011 272 276
5. Modeling and comparative analysis of DC characteristics of AlGaN/GaN HEMT and MOSHEMT devices;Jena;Int J Numer Model Electron Netw. Devices Fields,2015