Natural overlaying behaviors push the limit of planar cyclic deformation performance in few‐layer MoS2 nanosheets

Author:

Li Peifeng1ORCID,Zhang Guangjie2,Kang Zhuo34,Zheng Xin5,Xie Yong34,Liang Chunyuan6,Zhang Yizhi6,Fang Xiaoyang6,Sun Rong1,Liu Zhiquan1,Bu Yeqiang6,Lu Yang7,Zhang Yue34ORCID

Affiliation:

1. Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences Shenzhen the People's Republic of China

2. CAS Key Laboratory of Standardization and Measurement for Nanotechnology CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology Beijing the People's Republic of China

3. Beijing Advanced Innovation Center for Materials Genome Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies University of Science and Technology Beijing Beijing the People's Republic of China

4. State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering University of Science and Technology Beijing Beijing the People's Republic of China

5. College of Chemistry and Materials Engineering Zhejiang A&F University Hangzhou the People's Republic of China

6. Center for X‐mechanics, School of Aeronautics and Astronautics Zhejiang University Hangzhou People's Republic of China

7. Department of Mechanical Engineering The University of Hong Kong Hong Kong the People's Republic of China

Abstract

AbstractAs a typical two‐dimensional (2D) transition metal dichalcogenides (TMDCs) material with nonzero band gap, MoS2 has a wide range of potential applications as building blocks in the field of nanoelectronics. The stability and reliability of the corresponding nanoelectronic devices depend critically on the mechanical performance and cyclic reliability of 2D MoS2. Although an in situ technique has been used to analyze the mechanical properties of 2D materials, the cyclic mechanical behavior, that is, fatigue, remains a major challenge in the practical application of the devices. This study was aimed at analyzing the planar cyclic performance and deformation behavior of three‐layer MoS2 nanosheets (NSs) using an in situ transmission electron microscopy (TEM) variable‐amplitude uniaxial low‐frequency and cyclic loading–unloading tensile acceleration test. We also elucidated the strengthening effect of the natural overlaying affix fragments (other external NSs) or wrinkle folds (internal folds from the NS itself) on cycling performances and service life of MoS2 NSs by delaying the whole process of fatigue crack initiation, propagation, and fracture. The results have been confirmed by molecular dynamics (MDs) simulations. The overlaying enhancement effect effectively ensures the long‐term reliability and stability of nanoelectronic devices made of few‐layer 2D materials.image

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Materials Science (miscellaneous),Electronic, Optical and Magnetic Materials

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