Alternately Intercalated Heterostructures of Carbon and MoS 2 Monolayers as Saturable Absorber for Ultrashort Femtosecond Mode‐Locked Lasers-Reference-Cited by-同舟云学术

Alternately Intercalated Heterostructures of Carbon and MoS 2 Monolayers as Saturable Absorber for Ultrashort Femtosecond Mode‐Locked Lasers

Published:2021-07-16 Issue:19 Volume:9 Page:2100699
ISSN:2195-1071
Container-title:Advanced Optical Materials
language:en
Short-container-title:Advanced Optical Materials

Author:

Jing Laiying¹,Wang Yiran¹,Lian Gang¹^ORCID,Zhang Baitao¹,Cui Deliang¹,He Jingliang¹,Wang Qilong²,Wong Ching‐Ping³

Affiliation:

1. State Key Lab of Crystal Materials Shandong University Jinan 250100 P. R. China

2. Key Laboratory for Special Functional Aggregated Materials of Education Ministry School of Chemistry & Chemical Engineering Shandong University Jinan 250100 P. R. China

3. School of Materials Science and Engineering Georgia Institute of Technology Atlanta GA 30332 USA

Funder

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adom.202100699

Reference37 articles.

1. Emerging 2D materials beyond graphene for ultrashort pulse generation in fiber lasers

2. Low-dimensional nanomaterial saturable absorbers for ultrashort-pulsed waveguide lasers

3. Analysis of passively Q-switched lasers with simultaneous mode locking

4. Semiconductor saturable absorber mirrors (SESAM's) for femtosecond to nanosecond pulse generation in solid-state lasers

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