Water‐Stable and Photo‐Patternable Siloxane‐Encapsulated Upconversion Nanoparticles toward Flexible Near‐Infrared Phototransistors

Author:

Lee Injun12ORCID,Park Cheolmin3,Kim Tae Soo2,Kang Minsoo2,Oh Hyeongyeol4,Jang Jinhyeong2,Park Jungjae2,Yuk Jong Min2,Lee Hohjai4,Park Chan Beum2,Choi Sung‐Yool3,Kang Kibum2,Lee Wonryung5,Bae Byeong‐Soo12ORCID

Affiliation:

1. Wearable Platform Materials Technology Center (WMC) Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

2. Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

3. School of Electrical Engineering Graphene/2D Materials Research Center Center for Advanced Materials Discovery towards 3D Display Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

4. Department of Chemistry Gwangju Institute of Science and Technology (GIST) Gwangju 61005 Republic of Korea

5. Center for Theragnosis Biomedical Research Institute Korea Institute of Science and Technology (KIST) Seoul 02792 Republic of Korea

Abstract

AbstractUpconversion nanoparticles (UCNPs), as near‐infrared (NIR) absorbers, are promising materials for use in flexible NIR photodetectors, which can be applied for wearable healthcare applications due to their advantages in a broad spectral range, high photostability, and biocompatibility. However, to apply UCNPs in wearable and large‐area integrated devices, water stability and micro‐patterning methods are required. In this work, the UCNPs are encapsulated with a siloxane polymer (UCNP@SiOx) via a sol–gel process to enable photo‐patternability and photo‐stabililty in water conditions. The UCNP@SiOx can be photo‐patterned down to micron‐scale feature sizes and exhibit no significant decrease in upconversion photoluminescence (PL) intensities and PL decay time after immersion in water for 2 h. Moreover, UCNP@SiOx is evaluated by an in vitro biocompatibility test and found to be non‐toxic. By integrating the UCNP@SiOx with MoS2 phototransistors (MoS2 + UCNP@SiOx), the devices exhibit enhanced responsivity (0.79 A W−1) and specific detectivity (2.22 × 107 Jones), which are 2.8 times higher than in the bare MoS2 phototransistors, and excellent mechanical durability over 1000 cycles of 20% compression and re‐stretch test. This work opens the way for the facile synthesis of water‐stable and photo‐patternable siloxane‐encapsulated UCNPs and a strategy for fabricating high‐performance flexible NIR phototransistors through wavelength conversion.

Funder

National Research Foundation of Korea

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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