Impact of Oxygen Reservoir Layer on 3T Oxygen Ion‐based Electrochemical Random Access Memory Performance

Author:

Kim Hyejin1,Han Geonhui1,Seo Jongseon1,Lee Daeseok1ORCID

Affiliation:

1. Department of Electronics Materials Engineering 20 Kwangwoon Seoul Nowon‐Gu 01897 Republic of Korea

Abstract

AbstractThis study investigates the impact of an oxygen reservoir layer on the performance of three‐terminal (3T) oxide ion‐based electrochemical random access memory (Ox‐ECRAM). Three Ox‐ECRAM synapse devices are compared: single layer, double 1, and double 2. The results indicate that the oxygen reservoir layer is crucial for maintaining channel conductance while preventing gate leakage. The oxygen reservoir layer also modulates conductance via the absorption and supply of oxygen ions. In addition, the ion migration barrier energy of the oxygen reservoir layer plays a key role in the reliability of the Ox‐ECRAM, with higher values leading to more stable retention and endurance. The results of this study highlight the importance of the oxygen reservoir layer in Ox‐ECRAM performance.

Funder

Ministry of Science and ICT, South Korea

Kwangwoon University

National Research Foundation of Korea

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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