A Deep Study of Resistance Switching Phenomena in TaO x ReRAM Cells: System‐Theoretic Dynamic Route Map Analysis and Experimental Verification

Author:

Ascoli Alon1ORCID,Menzel Stephan2,Rana Vikas3,Kempen Tim3,Messaris Ioannis1,Demirkol Ahmet Samil1,Schulten Michael4,Siemon Anne4,Tetzlaff Ronald1

Affiliation:

1. Technische Universität Dresden School of Engineering Sciences Faculty of Electrical and Computer Engineering Institute of Principles of Electrical and Electronic Engineering (IEE) Chair of Fundamentals of Electrical Engineering Toeplerbau, Mommsenstraße 12 01069 Dresden Germany

2. Peter Grünberg Institut 7 (PGI‐7) Forschungszentrum Jülich GmbH Wilhelm‐Johnen‐Strasse 52425 Jülich Germany

3. Peter Grünberg Institut 10 (PGI‐10) Forschungszentrum Jülich GmbH Wilhelm‐Johnen‐Strasse 52425 Jülich Germany

4. Institut für Werkstoffe der Elektrotechnik 2 RWTH Aachen University Sommerfeldstraße 24 52074 Aachen Germany

Funder

Deutsche Forschungsgemeinschaft

Bundesministerium für Bildung und Forschung

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

Reference59 articles.

1. Design of ion-implanted MOSFET's with very small physical dimensions

2. GlobalFoundries Halts 7nm Work https://www.eetimes.com/globalfoundries-halts-7nm-work/(accessed: July 2022).

3. What's Next? [The end of Moore's law]

4. Memristor-The missing circuit element

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