Fabrication of Nearly-Hyperuniform Substrates by Tailored Disorder for Photonic Applications-Reference-Cited by-同舟云学术

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Fabrication of Nearly-Hyperuniform Substrates by Tailored Disorder for Photonic Applications

Published:2018-02-12 Issue:7 Volume:6 Page:1701272
ISSN:2195-1071
Container-title:Advanced Optical Materials
language:en
Short-container-title:Advanced Optical Materials

Author:

Piechulla Peter M.¹,Muehlenbein Lutz¹,Wehrspohn Ralf B.¹²^ORCID,Nanz Stefan³,Abass Aimi⁴,Rockstuhl Carsten³⁴,Sprafke Alexander¹^ORCID

Affiliation:

1. Institute of Physics; Martin Luther University Halle-Wittenberg; 06120 Halle Germany

2. Fraunhofer Institute for Microstructure of Materials and Systems IMWS; 06120 Halle Germany

3. Institute of Theoretical Solid State Physics; Karlsruhe Institute of Technology; 76131 Karlsruhe Germany

4. Institute of Nanotechnology; Karlsruhe Institute of Technology; 76021 Karlsruhe Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference57 articles.

1. Roadmap on optical energy conversion

2. International Technology Roadmap for Photovoltaic (ITRPV) 8th ed. 2017 http://www.itrpv.net

3. Anisotropic etching of silicon

4. Metal-Assisted Chemical Etching of Silicon: A Review

5. The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching

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