Spin-on-glass (SOG) for the trilayer imaging process-Reference-Cited by-同舟云学术

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Spin-on-glass (SOG) for the trilayer imaging process

Published:2003-02-19 Issue:3 Volume:88 Page:636-640
ISSN:0021-8995
Container-title:Journal of Applied Polymer Science
language:en
Short-container-title:J. Appl. Polym. Sci.

Author:

Sugita Hikaru,Saito Akio,Konno Keiji,Hayasui Akihiro,Nishiyama Satoru,Ebisawa Masahiko,Nishikawa Michinori,Ohta Yoshihisa,Tominaga Tetsuo

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

Reference25 articles.

1. Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

2. Impact of reduced resist thickness on deep ultraviolet lithography

3. Advance of resist profile control in multilayer resist process for sub-150-nm lithography

4. Spin‐On Glass as an Intermediate Layer in a Tri‐Layer Resist Process

5. Lift‐off of thick metal layers using multilayer resist

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Styryl silsesquioxane photoresist;Journal of Applied Polymer Science;2014-09-24

2. Comparison of single-, bi-, and tri-layer resist process;SPIE Proceedings;2005-05-04

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