Photocatalytic Degradation of Ofloxacin in Wastewater Using Mg‐Ni Co‐doped TiO2 Catalyst

Author:

Malhotra Mitresh1,Garg Alok2ORCID,Rawat Manish3

Affiliation:

1. Thapar Institute of Technology School of Chemistry & Biochemistry 147004 Patiala Punjab India

2. National Institute of Technology Department of Chemical Engineering 177005 Hamirpur Himachal Pradesh India

3. Manipal University Jaipur Department of Mechatronics Engineering 303007 Jaipur India

Abstract

AbstractThis study focuses on the preparation and characterization of Mg‐Ni co‐doped TiO2 and its application in the degradation of the pharmaceutical ofloxacin (OFX) under solar irradiation. A wet impregnation method was used to prepare Mg‐Ni co‐doped TiO2. Characterization, optimization, and kinetic studies revealed that the doped TiO2 material is effective in degrading OFX, with potential applications in water treatment or environmental remediation processes. Ultraviolet diffuse reflectance spectroscopy indicated that the band gap of TiO2 was reduced due to doping with Mg and Ni. A reduced band gap can enhance the material's photocatalytic properties, which is important for its application in solar‐driven degradation processes. The catalyst dose and OFX concentration for the degradation process were optimized. A catalyst dose of 2 g L−1 and an OFX solution with a concentration of 40 ppm, maintained at pH 5, resulted in the highest degradation efficiency. The degradation process followed first‐order kinetics, suggesting that the rate of degradation increased with increasing doping.

Publisher

Wiley

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3