Origin of the Memory Effect in Electrochromic Sputtered WO3 Films: Composition, Structure, or Morphology?

Author:

Faceira Brandon1,Teulé‐Gay Lionel1,Le Hébel Jade12,Labrugère‐Sarroste Christine2,Ibalot Fabienne2,Huang Hou‐Yi3,Huang Yu‐Cheng3,Dong Chung‐Li3,Salvetat Jean‐Paul2,Maglione Mario1,Rougier Aline1ORCID

Affiliation:

1. Univ. Bordeaux CNRS Bx INP ICMCB UMR 5026 Pessac F‐33600 France

2. Univ. Bordeaux, CNRS PLACAMAT UAR 3626 Pessac F‐33600 France

3. Research Center for X‐ray Science & Department of Physics Tamkang University Tamsui 25137 Taiwan

Abstract

AbstractThe memory effect property, described as a reversible color persistence while the potential is withdrawn, is of particular importance to reaching zero‐energy consumption electrochromic devices. Nevertheless, often observed in organic materials, it is poorly studied in oxides. In this study, electrochromic tungsten oxide thin films are elaborated at different working pressures by radiofrequency magnetron sputtering. The influence of the deposition pressure on the electrochemical properties of WO3 films as well as on their memory effect is investigated. Three kinds of WO3 films can be distinguished: with irreversible blue coloration, with reversible coloration presenting a high memory effect, and with reversible coloration with a low memory effect. The origin of these discrepancies is studied through the composition, the local atomic environment, and the morphology of the WO3 thin films. An increase of transmittance at 550 nm as low as 15.8% in 48 h in air and 5.2% in 24 h in the electrolyte is recorded. This study highlights a better understanding of the memory effect property of electrochromic oxides for low‐consumption energy electrochromic devices, pointing out morphology as a key parameter.

Funder

Université de Bordeaux

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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