Affiliation:
1. Infineon Technologies AG Am Campeon 6 85579 Neubiberg Germany
2. Chair of Electronic Devices RWTH Aachen University Otto‐Blumenthal‐Straße 25 52074 Aachen Germany
3. Infineon Technologies AG Wernerwerkstraße 2 93049 Regensburg Germany
4. Protemics GmbH Otto‐Blumenthal‐Straße 25 52074 Aachen Germany
5. AMO GmbH Otto‐Blumenthal‐Straße 25 52074 Aachen Germany
Abstract
AbstractDispersion‐based graphene materials are promising candidates for various sensing applications. They offer the advantage of relatively simple and fast deposition via spin‐coating, Langmuir–Blodgett deposition, or inkjet printing. Film uniformity and reproducibility remain challenging in all of these deposition methods. Here, a scalable structuring method is demonstrated, characterized, and successfully applied for graphene dispersions. The method is based on a standard lift‐off process, is simple to implement, and increases the film uniformity of graphene devices. It is also compatible with standard semiconductor manufacturing methods. Two different graphene dispersions are investigated via Raman spectroscopy and Atomic Force Microscopy and observe no degradation of the material properties by the structuring process. Furthermore, high uniformity of the structured patterns and homogeneous graphene flake distribution is achieved. Electrical characterizations show reproducible sheet resistance values correlating with material quantity and uniformity. Finally, repeatable humidity sensing is demonstrated with van der Pauw devices, with sensing limits of less than 1% relative humidity.