Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties-Reference-Cited by-同舟云学术

Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties

Published:2021-09-24 Issue:20 Volume:8 Page:2100949
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Zywitzki Dennis¹,Schaper Raoul²,Ciftyürek Engin³,Wree Jan‐Lucas¹^ORCID,Taffa Dereje H.²,Baier Daniel M.¹,Rogalla Detlef⁴,Li Yujiao⁵,Meischein Michael⁶,Ludwig Alfred⁵⁶,Li Zheshen⁷,Schierbaum Klaus³,Wark Michael²,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials Chemistry Ruhr University Bochum Universitätsstraße 150 44801 Bochum Germany

2. Chemical Technology 1 Institute of Chemistry Carl von Ossietzky University Oldenburg Carl‐von‐Ossietzky Straße 9‐11 26129 Oldenburg Germany

3. Department of Materials Science Institute of Experimental Physics and Condensed Matter Heinrich‐Heine‐University Düsseldorf 40225 Düsseldorf Germany

4. RUBION Ruhr University Bochum Universitätsstraße 150 44801 Bochum Germany

5. Center for Interface‐Dominated High Performance Materials (ZGH) Ruhr University Bochum Universitätsstraße 150 44801 Bochum Germany

6. Materials Discovery and Interfaces Institute for Materials Ruhr University Bochum Universitätsstraße 150 44801 Bochum Germany

7. ISA Centre for Storage Ring Facilities Department of Physics and Astronomy Aarhus University Ny Munkegade 120 Aarhus 8000C Denmark

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202100949

Reference68 articles.

1. Materials for electrochemical capacitors