Synthesis and characterization of novel copolymers with acid-labile ketal moieties derived from camphor
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference25 articles.
1. U.S. Pat. 6,207,991 B1 (2001).
2. Negative photoresists for optical lithography
3. Photoresists for 193-nm lithography
4. Three-component photoresists based on thermal crosslinking and acidolytic cleavage
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