Effect of the Si-SiO2 interface state density and the charge in the SiO2 film on the electrical properties in Pt–diffused MOS structure
Author:
Publisher
Wiley
Subject
Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy
Reference10 articles.
1. Differences between platinum- and gold-doped silicon power devices
2. Comparison of gold, platinum, and electron irradiation for controlling lifetime in power rectifiers
3. The influence of platinum in the Si SiO2 system
4. Platinum-induced hysteresis and nonvolatile memory properties in MOS systems (PLATMOS)
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1. Covalent Assembly of Gold Nanoparticles: An Application toward Transistor Memory;The Journal of Physical Chemistry B;2012-08-02
2. Improved performance of nanocrystal memory for aminosilane-mediated Au–SiO2embedded core–shell nanoparticles;J. Mater. Chem.;2012
3. Covalent Assembly of Gold Nanoparticles for Nonvolatile Memory Applications;ACS Applied Materials & Interfaces;2011-11-10
4. Memory characteristics of a self-assembled monolayer of Pt nanoparticles as a charge trapping layer;Nanotechnology;2008-06-12
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