Recent advances in dual mode charge compensation for XPS analysis-Reference-Cited by-同舟云学术

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Recent advances in dual mode charge compensation for XPS analysis

Published:2019-06-25 Issue:9 Volume:51 Page:925-933
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf Interface Anal

Author:

Edwards Lee¹,Mack Paul²,Morgan David J.¹³^ORCID

Affiliation:

1. Cardiff Catalysis Institute, School of ChemistryCardiff University Cardiff UK

2. Thermo Fisher Scientific, Birches Industrial Estate East Grinstead, West Sussex UK

3. G.63 Research Complex at Harwell (RCaH)HarwellXPS—The EPSRC National Facility for Photoelectron Spectroscopy Didcot UK

Funder

Engineering and Physical Sciences Research Council

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.6680

Reference29 articles.

1. Advances in charge neutralization for XPS measurements of nonconducting materials

2. WalkerA.Vol. US Patent: 4810879 1989.

3. Surface charge neutralization of insulating samples in x-ray photoemission spectroscopy

4. The surface analysis of insulators by SIMS: Charge neutralization and stabilization of the surface potential

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