First Principles Calculation of Compatibility between Environmentally Friendly Insulating Gas C5F10O and CuW Contacts

Author:

Ding Can1,Gao Zhenjiang1,Feng Lu1,Yuan Zhao1

Affiliation:

1. College of Electrical Engineering and New Energy China Three Gorges University Yichang 443002 China

Abstract

The insulating gas and contacts in the arc extinguishing chamber of high‐voltage circuit breakers are the focus of research. In practical applications, the gas may react with the surface of the contacts. In this paper, C5F10O environmental friendly insulating gas, which has one of the potential alternatives, is selected as the research object. The compatibility of C5F10O and its decomposition products with CuW contacts was studied. This article uses the Dmol3 program based on density functional theory. The adsorption energy, transfer charge, and density of electronic states of C5F10O and selected typical decomposition products on the Cu (111) surface and Cu‐W surface were calculated, respectively. It was found that the original CuW metal properties were not changed before and after adsorption. The carbonyl O atom in C5F10O is easily adsorbed on the top of the Cu (111) surface, forming a stable CuO bond, which belongs to chemical adsorption. The interaction of the other three adsorption sites is weaker than that of the top site adsorption, which belongs to physical adsorption. C5F10O exhibits more active charge transfer and forms active W‐O chemical bonds when adsorbed on CuW surfaces than SF6. C5F10O has poorer compatibility with CuW alloy than SF6. C2F4 and C3F6 in the decomposition gas are chemically adsorbed on the Cu‐W surface. CO2, CF4, C2F6, and C3F8 do not form chemical bonds on the CuW surface. The adsorption stability of COF2 is weaker than that of CF4, C2F6, and C3F8. Compared with SF6 adsorption, the compatibility of C5F10O and CO2 on the surface of CuW contact is inferior to that of Cu contact. CF4, C2F6, C3F8, and COF2 in the decomposition gas can be compatible with the surface of the CuW contact. C2F4 and C3F6 cannot be well compatible with the surface of CuW contacts. © 2023 Institute of Electrical Engineer of Japan and Wiley Periodicals LLC.

Publisher

Wiley

Subject

Electrical and Electronic Engineering

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3