Author:
Treichel H.,Mitwalsky A.,Tempel G.,Zorn G.,Bohling D. A.,Coyle K. R.,Felker B. S.,George M.,Kern W.,Lane A. P.,Sandler N. P.
Subject
General Chemical Engineering,Electronic, Optical and Magnetic Materials
Reference35 articles.
1. and Proc. of the 8th European Conf. on CUD J. Physique IV, Glasgow, UK., 1991.
2. and Proc. Semicon Korea, Korean Trade Mission, Seoul, 1992.
3. Low-Pressure chemical vapour deposition of tantalum pentoxide films for ulsi devices using tantalum pentaethoxide as precursor
4. and Proc. MRS Fall Meet., Boston, 1991.
5. Deposition, Annealing, and Characterization of Tantalum Pentoxide Films
Cited by
32 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献