Photophysical processes in low-fluence UV laser-material interaction and the relevance to atomic layer processing-Reference-Cited by-同舟云学术

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Photophysical processes in low-fluence UV laser-material interaction and the relevance to atomic layer processing

Published:1993-02 Issue:1-2 Volume:2 Page:31-42
ISSN:1057-9257
Container-title:Advanced Materials for Optics and Electronics
language:en
Short-container-title:Adv. Mater. Opt. Electron.

Author:

Helvajian H.,Wiedeman L.,Kim H.-S.

Publisher

Wiley

Subject

General Chemical Engineering,Electronic, Optical and Magnetic Materials

Reference59 articles.

1. Nanolithography and its prospects as a manufacturing technology

2. and (eds), Micro Electro Mechanical System, IEEE (91CH2957-9), New York, 1991.

3. and (eds), Micro Electro Mechanical System, IEEE (92CH3093-2), New York, 1992.

4. S. Middlehoek (ed.), Sensors and Actuators, 1989, 20 and articles therein.

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Process Control in Laser Material Processing for the Micro and Nanometer Scale Domains;Laser Precision Microfabrication;2010

2. Overview of the user program for the Jefferson Lab free-electron laser;Laser Applications in Microelectronic and Optoelectronic Manufacturing IV;1999-07-15

3. Modification of cleaved surfaces of Bi2Sr2CaCu2O8 single crystals induced by ArF excimer laser irradiation;Applied Surface Science;1999-04

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