Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX-Deposition-Reference-Cited by-同舟云学术

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Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX-Deposition

Published:1990 Issue:5 Volume:30 Page:637-648
ISSN:0863-1042
Container-title:Contributions to Plasma Physics
language:en
Short-container-title:Contrib. Plasma. Phys.

Author:

Lunk A.,Basner R.

Publisher

Wiley

Subject

Condensed Matter Physics

Reference9 articles.

1. Plasma Processes in Activated Thin Film Deposition

2. , , 7th Conf. Vacuum/Thin Films, Dresden 1981, Vol. 2, 300.

3. et al., 7th int. Symp. Plasma Chemistry, Eindhoven 1985, Vol. 1, 123.

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2. Influence of the deposition parameters on boron nitride growth mechanisms in a hollow cathode arc evaporation device;Surface and Coatings Technology;1997-06

3. Deposition of c-BN films in a hollow cathode arc evaporation device;Diamond and Related Materials;1996-11

4. Infrared ellipsometric characterization of mixed phase BN layers deposited by plasma enhanced physical vapor deposition;Surface and Coatings Technology;1995-09

5. Langmuir probe plasma diagnostics during TiNx deposition;Materials Science and Engineering: A;1991-07

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