Author:
Statev Sv.,Ivanov I.,Petrov I.,Carlsson J.,Orlinov V.
Reference39 articles.
1. , Physics of Thin Films, ed by and , Vol. 2, p. 363 (Academic, New York, 1964) and refs. therein.
2. Trans. 10th Nat. Vac. Symp. (American Vacuum Society, 1964) p. 325.
3. Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
4. Deposition of Tantalum, Tantalum Oxide, and Tantalum Nitride with Controlled Electrical Characteristics
5. The mechanism of reactive sputtering