1. New UV Resists with Negative or Positive Tone;Ito;Digest of Technical Papers of 1982 Symposium on VLSI Technology
2. Chemical Amplification in the Design of Dry Developing Resist Materials;Ito;Technical Papers of SPE Regional Technical Conference on Photopolymers,1982
3. Novel Photoacid Generators;Asakura;J. Photopolym. Sci. Technol,2000
4. Novel nonionic photoacid generator releasing strong acid for chemically amplified resists;Yamato;Proc. SPIE,2004
5. Prepolymers and reactive diluents for UV and EB curable formulations. In Chemistry & Technology of UV & EB Formulation for Coatings;Allen,1991