Poly(2-vinylnaphthalene)-block- poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching-Reference-Cited by-同舟云学术

Poly(2-vinylnaphthalene)-block- poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching

Published:2011-06-21 Issue:16 Volume:212 Page:1735-1741
ISSN:1022-1352
Container-title:Macromolecular Chemistry and Physics
language:en
Short-container-title:Macromol. Chem. Phys.

Author:

Zhang Xin,Metting Christopher J.,Briber Robert M.,Weilnboeck Florian,Shin Sang Hak,Jones Benjamin G.,Oehrlein Gottlieb S.

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/macp.201100232/fullpdf

Reference27 articles.

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5. A Simple Route to Highly Oriented and Ordered Nanoporous Block Copolymer Templates

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