Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering-Reference-Cited by-同舟云学术

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Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering

Published:2009-06 Issue:S1 Volume:6 Page:S751-S754
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes Polym.

Author:

Saraiva Marta,Chen Hong,Leroy Wouter P.,Mahieu Stijn,Jehanathan Neerushana,Lebedev Oleg,Georgieva Violeta,Persoons Rosita,Depla Diederik

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference29 articles.

1. The control of thin film deposition and recent developments in oxide film growth

2. Elastic properties and high-pressure behavior of from ab initio calculations

3. Translucent Sintered MgAl2O4

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of the target–substrate distance on the growth of YSZ thin films;Surface and Coatings Technology;2014-02

2. Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films;Surface and Coatings Technology;2014-01

3. The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films;Thin Solid Films;2012-12

4. Influence of Al concentration on the optoelectronic properties of Al-doped MgO;Physical Review B;2012-11-28

5. Sputter deposition of MgxAlyOzthin films in a dual-magnetron device: a multi-species Monte Carlo model;New Journal of Physics;2012-07-20

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