A Time- and Angle-Resolved X-Ray Photoelectron Spectroscopy Study of Polystyrene Exposed to a Helium Plasma
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Towards chemical state resolution in regularized depth profiles derived from ARXPS data taken on plasma-oxidized polystyrene;Applied Surface Science;2009-08
2. Surface modification of poly(ε-caprolactone) using a dielectric barrier discharge in atmospheric pressure glow discharge mode;Acta Biomaterialia;2009-07
3. On the choice of the regularization parameter for the interpretation of ARXPS data using a multilayer model;Journal of Electron Spectroscopy and Related Phenomena;2008-07
4. Angle-Resolved XPS Study of Plasma-Deposited Polystyrene Films after Oxygen Plasma Treatment;Plasma Processes and Polymers;2008-01-10
5. ARXPS investigation of diffusion as a limiting process in the incorporation of adatoms into polystyrene surfaces treated by nitrogen plasmas;Surface and Interface Analysis;2007
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