Development of VHF Plasma Source with Short Discharge Gap for Solar Cells-Reference-Cited by-同舟云学术

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Development of VHF Plasma Source with Short Discharge Gap for Solar Cells

Published:2009-06 Issue:S1 Volume:6 Page:S273-S277
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes Polym.

Author:

Yamauchi Yasuhiro,Baba Tomoyoshi,Takeuchi Yoshiaki,Takatsuka Hiromu,Muta Hiroshi,Uchino Kiichiro,Kawai Yoshinobu

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.200930610/fullpdf

Reference13 articles.

1. High rate growth of microcrystalline silicon at low temperatures

2. Device-Grade Amorphous Silicon Prepared by High-Pressure Plasma

3. High rate growth of microcrystalline silicon by VHF-GD at high pressure

4. Large area VHF plasma production by a balanced power feeding method

5. Characteristics of VHF H2 Plasma Produced at High Pressure

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation of balanced power feeding plasma surrounded by a metal box;Japanese Journal of Applied Physics;2014-12-18

2. Simulation of Effective Production of Very High Frequency Hydrogen Plasma Using a Balanced Power Feeding Method;Japanese Journal of Applied Physics;2013-11-01

3. Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding;Thin Solid Films;2013-11

4. Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition;Thin Solid Films;2012-11

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