Affiliation:
1. Department of Basic Science Graduate School of Arts and Sciences The University of Tokyo 3-8-1, Komaba, Meguro-ku Tokyo 153-8902 Japan
2. PRESTO Japan Science and Technology Agency 4-1-8, Honcho Kawaguchi Saitama 332-0012 Japan
Abstract
AbstractPhotopolymerization and photoprocessing are core technologies for molding and tuning polymer materials. However, they are incompatible with single materials owing to their contradictory photoreactivity. Herein, an acid‐induced photocleavable crosslinker, a platinum–acetylide complex covered by permethylated cyclodextrins, enables the fabrication of photoprocessable materials via photopolymerization with N‐(2‐hydroxyethyl)acrylamide. The polymer networks are molded by 365 nm irradiation as well as softened and degraded by a cooperative reaction with HCl as an acidic additive under 365 nm UV light, or 470 nm visible light in the presence of a photosensitizer. Moreover, the crosslinker is applied to a photoadhesive triggered by 365 nm irradiation. The adhesion is detachable on‐demand through acid‐induced photodegradation with the same wavelength and intensity of irradiation. Thus, acid‐induced photocleavage allows the integration of light‐induced molding and processing under various lights of various wavelengths, opening up new strategies for polymer technologies.