Affiliation:
1. School of Chemical Engineering and Light Industry Guangdong University of Technology Guangzhou 510006 P.R. China
2. State Key Laboratory of Fine Chemicals, School of Chemical Engineering Dalian University of Technology Dalian 116024 P. R. China
3. College of Chemistry and Chemical Engineering, and Key Laboratory for Preparation and Application of Ordered Structural Materials of Guangdong Province Shantou University Shantou 515063 P.R. China
Abstract
AbstractCurrently, most photoredox catalysis polymerization systems are limited by high excitation power, long polymerization time, or the requirement of electron donors due to the precise design of efficient photocatalysts still poses a great challenge. Herein, we propose a new approach: the creation of efficient photocatalysts having low ground state oxidation potentials and high excited state energy levels, along with through‐space charge transfer (TSCT) induced intersystem crossing (ISC) properties. A cabazole‐naphthalimide (NI) dyad (NI‐1) characterized by long triplet excited state lifetime (τT=62 μs), satisfactory ISC efficiency (ΦΔ=54.3 %) and powerful reduction capacity [Singlet: E1/2 (PC+1/*PC)=−1.93 eV, Triplet: E1/2 (PC+1/*PC)=−0.84 eV] was obtained. An efficient and rapid polymerization (83 % conversion of 1 mM monomer in 30 s) was observed under the conditions of without electron donor, low excitation power (10 mW cm−2) and low catalyst (NI‐1) loading (<50 μM). In contrast, the conversion rate was lower at 29 % when the reference catalyst (NI‐4) was used for photopolymerization under the same conditions, demonstrating the advantage of the TSCT photocatalyst. Finally, the TSCT material was used as a photocatalyst in practical lithography for the first time, achieving pattern resolutions of up to 10 μm.
Funder
Basic and Applied Basic Research Foundation of Guangdong Province
National Natural Science Foundation of China