Azide photoresists for projection photolithography
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference10 articles.
1. and Editors, ?Handbook of Thin Film Technology,? 7-27, McGraw-Hill, New York (1970).
2. Editor, ?Ultra-Microminiaturization Precision Photography,? SPSE, Washington (1968).
3. U. S. Patent 2,940,853.
4. U. S. Patent 3,695,886.
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