Positive and negative photoresist applications of thin films surface-photopolymerized from hexachlorobutadiene-Reference-Cited by-同舟云学术

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Positive and negative photoresist applications of thin films surface-photopolymerized from hexachlorobutadiene

Published:1972-05 Issue:3 Volume:12 Page:209-212
ISSN:0032-3888
Container-title:Polymer Engineering and Science
language:en
Short-container-title:Polym. Eng. Sci.

Author:

Kunz C. O.,Long P. C.,Wright A. N.

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry

Reference8 articles.

1. Proc. Chem. Soc., 337 (1961).

2. Postprints SPE RETEC, Ellenville, N. Y., 110 (Nov. 1967)

3. and ?Proc. Symp. on Photochemistry of Macro-molecules,? Anaheim, Cal. (1969)

4. ?Proc. Symp. on Photochemistry of Macro-molecules,? Plenum Press, 117 (1970).

5. Surface Photopolymerization of Vinyl and Diene Monomers

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