Terahertz Metasurface Modulators Based on Photosensitive Silicon

Author:

Zhou Qiangguo12ORCID,Li Yongzhen12,Wu Tuntan123,Qiu Qinxi1,Duan Jiaxin14,Jiang Lin1,Mao Wangchen12,Yao Niangjuan1,Huang Zhiming12356ORCID

Affiliation:

1. State Key Laboratory of Infrared Physics Shanghai Institute of Technical Physics Chinese Academy of Sciences 500 Yu Tian Road Shanghai 200083 P. R. China

2. University of Chinese Academy of Sciences, Chinese Academy of Sciences 19 Yu Quan Road Beijing 100049 P. R. China

3. Hangzhou Institute for Advanced Study University of Chinese Academy of Sciences 1 Sub‐Lane Xiangshan Hangzhou 310024 P. R. China

4. School of Science Xihua University 9999 Hongguang Avenue Chengdu 610039 P. R. China

5. Institute of Optoelectronics Fudan University 2005 Songhu Road Shanghai 200438 P. R. China

6. Key Laboratory of Space Active Opto‐Electronics Technology Shanghai Institute of Technical Physics Chinese Academy of Sciences 500 Yu Tian Road Shanghai 200083 P. R. China

Abstract

AbstractMetasurfaces solve the lack of materials in the terahertz (THz) band and control precisely the amplitude, phase, polarization, and transmission characteristics of THz waves, providing an effective way to realize THz functional devices. This article focuses on the design of THz metasurface modulators with a unit structure consisting of metal square rings, including resonance frequency, phase, and amplitude modulators. By embedding photosensitive semiconductor silicon (Si) in the unit structure, the unit structure is built from meta‐atom to molecularization model under the optical pumping condition, and the resonance frequencies are switched between high and low frequencies. The resonance frequency switchable characteristic is demonstrated using the equivalent LC oscillation circuit model, and the theoretical calculation results agree well with the simulations. Through theoretical calculations, the modulators achieve ultrafast switching times of less than 0.141 ps by the optical pumps, which have significant advantages in ultrafast THz modulators. By continuing to change the embedded position of the silicon in the unit structure, not only is a wide range of THz phase modulation achieved, but also multilevel modulation of the phase is realized. It is found that there is a strong relationship between the modulation depth and phase variation of THz waves, and a reasonable analysis is given. Further the amplitude modulator with a larger modulation depth (MD) is developed, and when the conductivity of photosensitive semiconductor silicon (σSi) reaches 2.5 × 106 S m−1, return loss (RL) is ≈0 dB, and the maximum MD reaches ≈100%; in order to gain insight into the nature of modulation, the modulation mechanism of THz waves under optical pumping conditions is analyzed. In addition, graphene‐based THz metasurface amplitude modulators are designed. When the depth of amplitude modulation is achieved by bias voltage modulation of the Fermi energy level of graphene, the maximum modulation amplitude is 23.42 dB, with a minimal modulation accuracy of 0.05 THz eV−1. In the article, the designed modulators have extremely excellent modulation performance. It has great potential applications in silicon‐based THz photonic devices, ultrahigh frequency electronic devices, high sensitivity sensors, and high‐precision imaging.

Funder

Chinese Academy of Sciences

Publisher

Wiley

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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