Ultrahigh Endurance and Extinction Ratio in Programmable Silicon Photonics Based on a Phase Change Material with ITO Heater

Author:

Xia Jian12,Wang Zixuan12,Yang Rui12ORCID,Wang Tianci12,Gong Junjie12,Dong Yunxiao12,Li Zhiyuan12,Yao Jiaping12,He Qiang12,Cheng Xiaomin12,Cheng Zengguang34,Zhou Peng34,Miao Xiangshui12

Affiliation:

1. School of Integrated Circuits Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology Wuhan 430074 China

2. Hubei Yangtze Memory Laboratories Wuhan 430205 China

3. State Key Laboratory of Integrated Chips and Systems School of Microelectronics Zhangjiang Fudan International Innovation Center Fudan University Shanghai 200433 China

4. Frontier Institute of Chip and System Shanghai Key Lab for Future Computing Hardware and System Fudan University Shanghai 200433 China

Abstract

AbstractPhase‐change‐materials (PCMs) integrated photonics have attracted extensive attention in the field of optical neural networks. However, present PCMs‐integrated photonics are still far from meeting the requirements in real‐world applications due to its unsatisfactory endurance (<3000 cycles) and extinction ratio (ER<20 dB). Here, ultrahigh endurance (>30 000 cycles) and large ER (≥50 dB) are achieved in the photonic device by introducing a trench structure to the indium tin oxide (ITO) heater and utilizing tin‐doped Ge2Sb2Te5 (Sn‐GST) as PCMs. This performance represents a landmark in the PCMs‐integrated photonics, since it solves the problem of poor endurance of ITO heaters and can be comparable to the state‐of the‐art devices in terms of endurance and ER. This excellent endurance and ER stem from the trench structure and high optical contrast PCM of Sn‐GST. Trench structure improves the heating efficiency of the ITO heater and effectively alleviates the thermal stress imposed on the ITO heater, resulting in ultrahigh endurance of the device. Sn‐doping is also beneficial to the endurance and ER improvement, because it can effectively reduce the crystallization temperature and increase the absorption coefficient of the PCM layer. This work provides a new technology for the development of programmable photonics with ultrahigh endurance.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Wuhan National Laboratory for Optoelectronics

Huazhong University of Science and Technology

Publisher

Wiley

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