Affiliation:
1. Research Center for Intelligent Chips and Devices Zhejiang Lab Hangzhou China
2. State Key Laboratory of Extreme Photonics and Instrumentation College of Optical Science and Engineering Zhejiang University Hangzhou China
3. College of Electronics and Information Engineering Shanghai University of Electric Power Shanghai China
4. ZJU‐Hangzhou Global Scientific and Technological Innovation Center Hangzhou China
Abstract
AbstractImproving the 3D resolution is a decisive step in the transition of direct laser writing from being limited to research use to being a powerful tool. Three‐color (3CL) lithography is expected to result in significantly higher resolution with two‐color lasers initiating polymerization in two steps and one‐color laser inhibiting polymerization. However, the 3CL process increases the complexity of the system and makes the influence of chromatic aberration worse which leads to non‐ideal writing results, which is ≈80 nm linewidth (≈λ/10) at present. In this study, the 3CL lithography is improved by introducing almost one color (1CL) instead of three colors to achieve subdiffraction 3D nanolithography based on two‐photon two‐step absorption and photoinhibition (T2A‐PI). Using benzil as a photoinitiator, a sub‐30 nm (<λ/17.5) lateral feature size, minimum 80 nm lateral, and 160 nm axial pitches are achieved, which, to our knowledge, is the best to be fabricated using the laser in the visible region. 3D woodpile photonic crystals and other high‐quality nanostructures are fabricated, demonstrating the unique advantages over existing direct laser writing technologies.
Funder
Natural Science Foundation of Zhejiang Province
China Postdoctoral Science Foundation
National Key Research and Development Program of China
Zhejiang Provincial Ten Thousand Plan for Young Top Talents
Major Scientific Project of Zhejiang Laboratory
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials