Reduction of dielectric constant by nanovoids formed through chemical treatment on silica crosslinked polyimide and its effect on properties

Author:

Yoo Taewon1,Ghorpade Ravindra V.1,Kim Kwangin1,Lee Juheon1,Lee Sangyoup2,Baek Seungsu3,Song Jungkun3,Han Haksoo1ORCID

Affiliation:

1. Department of Chemical and Biomolecular Engineering; Yonsei University, 262 Seongsanno, Seodaemun-gu; Seoul 120-749 South Korea

2. Samsung Electro-Mechanics Co. Ltd., Maeyoung-ro 150 Yeongtong-gu, Suwon; Gyeonggi-do 16674 South Korea

3. Agency for Defense Development, Yuseong, P.O. Box 35; Daejeon 305-600 South Korea

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

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