Ultrasonic-assisted mist chemical vapor deposition of II-oxide and related oxide compounds-Reference-Cited by-同舟云学术

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Ultrasonic-assisted mist chemical vapor deposition of II-oxide and related oxide compounds

Published:2014-04-04 Issue:7-8 Volume:11 Page:1225-1228
ISSN:1862-6351
Container-title:physica status solidi (c)
language:en
Short-container-title:Phys. Status Solidi C

Author:

Fujita Shizuo,Kaneko Kentaro,Ikenoue Takumi,Kawaharamura Toshiyuki,Furuta Mamoru

Publisher

Wiley

Subject

Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssc.201300655/fullpdf

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Discovery of a Robust P‐Type Ultrawide Bandgap Oxide Semiconductor: LiGa₅O₈;Advanced Electronic Materials;2023-11-12

2. Thin-Film Memristors and Memcapacitors for 3D Integration of Neuromorphic Systems;2023 IEEE 36th International System-on-Chip Conference (SOCC);2023-09-05

3. Enhanced Charge Separation and Transfer Efficiency of BiOI with the Dominantly Exposed (102) Facet for Sensitive Photoelectrochemical Photodetection;Inorganic Chemistry;2023-03-27

4. Heteroepitaxial Growth of an Ultrathin β-Ga₂O₃ Film on a Sapphire Substrate Using Mist CVD with Fluid Flow Modeling;ACS Omega;2022-11-04

5. Effect of film thickness and morphology on photoelectrochemical performance of (001) orientated BiOBr thin films prepared via mist CVD;Ceramics International;2022-09

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