The Effect of the Degree of Fluorination on the MOCVD Growth of Cobalt Oxide Thin Films using Co(II) Acetylacetonate Complexes-Reference-Cited by-同舟云学术

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The Effect of the Degree of Fluorination on the MOCVD Growth of Cobalt Oxide Thin Films using Co(II) Acetylacetonate Complexes

Published:2021-10-18 Issue:41 Volume:2021 Page:4298-4306
ISSN:1434-1948
Container-title:European Journal of Inorganic Chemistry
language:en
Short-container-title:Eur. J. Inorg. Chem.

Author:

Stienen Christian¹,Rogalla Detlef²,Prymak Oleg¹,Bendt Georg¹^ORCID

Affiliation:

1. University Duisburg-Essen Institute for Inorganic Chemistry Universitätsstraße 5-7 45117 Essen Germany

2. Ruhr-University Bochum RUBION 44801 Bochum Germany

Funder

Interdisciplinary Center for Analytics on the Nanoscale, University of Duisburg-Essen

Universität Duisburg-Essen

Publisher

Wiley

Subject

Inorganic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.202100662

Reference53 articles.

1. Phase equilibria in the cobalt oxide-copper oxide system

2. Elusive Co2O3: A Combined Experimental and Theoretical Study

3.

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