Optimal Design of Surface Relief Grating for High‐Resolution Two‐Photon Interference Lithography-Reference-Cited by-同舟云学术

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Optimal Design of Surface Relief Grating for High‐Resolution Two‐Photon Interference Lithography

Published:2022-03-31 Issue:6 Volume:5 Page:2200080
ISSN:2513-0390
Container-title:Advanced Theory and Simulations
language:en
Short-container-title:Advcd Theory and Sims

Author:

Ahn Jinseong¹,Park Junyong¹^ORCID

Affiliation:

1. School of Materials Science and Engineering Department of Energy Engineering Convergence Kumoh National Institute of Technology Gumi Gyeongbuk 39177 Republic of Korea

Funder

National Research Foundation of Korea

Korea Agency for Infrastructure Technology Advancement

Publisher

Wiley

Subject

Multidisciplinary,Modeling and Simulation,Numerical Analysis,Statistics and Probability

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adts.202200080

Reference30 articles.

1. On-chip natural assembly of silicon photonic bandgap crystals

2. 25th Anniversary Article: Ordered Polymer Structures for the Engineering of Photons and Phonons

3. Titania Woodpiles with Complete Three-Dimensional Photonic Bandgaps in the Visible

4. Chemical Aspects of Three-Dimensional Photonic Crystals

5. Fabrication of photonic crystals for the visible spectrum by holographic lithography

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving the working distance for near-field lithography with supercell photonic crystal;Optics Communications;2024-12

2. 基于微纳光学元件的增强现实技术;Laser & Optoelectronics Progress;2022

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