Nitroxide-mediated polymerization of adamantyl-functional methacrylates for 193 nm photoresists-Reference-Cited by-同舟云学术

Nitroxide-mediated polymerization of adamantyl-functional methacrylates for 193 nm photoresists

Published:2016-11-21 Issue:4 Volume:95 Page:708-716
ISSN:0008-4034
Container-title:The Canadian Journal of Chemical Engineering
language:en
Short-container-title:Can. J. Chem. Eng.

Author:

Marić Milan¹,Seok Juliana¹,Métafiot Adrien¹,Wylie Kevin¹

Affiliation:

1. Department of Chemical Engineering, McGill Institute of Advanced Materials (MIAM), Centre for Self-Assembled Chemical Structures (CSACS); McGill University, 3610 University Street; Montreal QC H3A 0C5 Canada

Funder

SURE program from the Faculty of Engineering

Publisher

Wiley

Subject

General Chemical Engineering

Reference47 articles.

1. Projection optical lithography

2. Recent progress in high resolution lithography

3. Electron beam lithography: resolution limits and applications

4. Photolithography at 193 nm

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